A reported attempt by a covert Chinese lab to reverse-engineer an EUV lithography scanner underscores that, despite access to scattered components, replicating ASML's EUV tools is effectively impossible without recreating the company's entire global supply ch…
A reported attempt by a covert Chinese lab to reverse-engineer an EUV lithography scanner underscores that, despite access to scattered components, replicating ASML's EUV tools is effectively impossible without recreating the company's entire global supply ch…